图像 |
型号 |
现有数量 |
单价(USD) |
工作温度 |
厂家 |
封装 |
PDF资料 |
 |
TA48S05AF(T6L1,Q) |
7970 |
面议 |
-40°C ~ 150°C |
Toshiba Semiconductor and Storage |
TO-252-6,DPak(5 引线 + 接片) |
 |
 |
TA48S05AF(T6L1,Q) |
7970 |
面议 |
-40°C ~ 150°C |
Toshiba Semiconductor and Storage |
TO-252-6,DPak(5 引线 + 接片) |
 |
 |
TA48S033AF(T6L1,Q) |
2000 |
面议 |
-40°C ~ 150°C |
Toshiba Semiconductor and Storage |
TO-252-6,DPak(5 引线 + 接片) |
 |
 |
TA48S033AF(T6L1,Q) |
3653 |
面议 |
-40°C ~ 150°C |
Toshiba Semiconductor and Storage |
TO-252-6,DPak(5 引线 + 接片) |
 |
 |
TA48S033AF(T6L1,Q) |
3653 |
面议 |
-40°C ~ 150°C |
Toshiba Semiconductor and Storage |
TO-252-6,DPak(5 引线 + 接片) |
 |
 |
TA48M0345F(6L1,SNQ |
6000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
TO-252-3,DPak(2 引线+接片),SC-63 |
 |
 |
TA48M0345F(6L1,SNQ |
6076 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
TO-252-3,DPak(2 引线+接片),SC-63 |
 |
 |
TA48M0345F(6L1,SNQ |
6076 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
TO-252-3,DPak(2 引线+接片),SC-63 |
 |
 |
TCR2EN21,LF |
10000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN21,LF |
13915 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN21,LF |
13915 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN36,LF |
10000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN36,LF |
17507 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN36,LF |
17507 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN31,LF |
14000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN31,LF |
30804 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN31,LF |
30804 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN13,LF |
10000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN13,LF |
19660 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN13,LF |
19660 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN19,LF |
20000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN19,LF |
20000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN19,LF |
20000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN10,LF |
10000 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |
 |
TCR2EN10,LF |
19148 |
面议 |
-40°C ~ 85°C |
Toshiba Semiconductor and Storage |
4-XFDFN 裸露焊盘 |
 |